Working Principle: Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films. Sputtering is a process whereby particles are ejected from a solid target material due to bombardment of the target by energetic particles, particularly, in the laboratory, gas ions. It only happens when the kinetic energy of the incoming particles is much higher than conventional thermal energies. This process can lead, during prolonged ion or plasma bombardment of a material, to significant erosion of materials, and can thus be harmful. On the other hand, it is commonly utilized for thin-film deposition, etching and analytical techniques. Multi arc magnetron sputtering compound ion coating technology is a new vacuum coating technology, which combines multi arc and magnetron sputtering together to get better functional and decorative film.
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